Optical Evaluation Systems for Magnetic Materials
(Magneto - Optical & Effects Evaluation Products)
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Micro Kerr Loop Measurement System
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Kerr Loop Measurement & Domain Observation System
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Magnetic Domain Observation Microscope
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Compact Kerr Microscope
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Perpendicular Magnetic Recording Media Evaluation System
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Soft Magnetic Layer Evaluation System
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HAMR Media Evaluation System
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Perpendicular Magnetic AnisotropyEvaluation System
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Polar Kerr Effect Measurement System for Wafer
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Longitudinal Kerr Effect Measurement System for Waferr
Micro Kerr Loop Measurement System
Model: BH-PI920 Series
Summary
Diode Laser based Kerr Loop Measurement System. Microscopic local measurement in the scale of few μm is available.

Specification
| Light Source | Diode Laser (408nm) *Other wavelength is available. |
|---|---|
| Measurement Kerr Effect | Polar Kerr Effect Longitudinal Kerr Effect |
| Laser Spot Diameter | φ2μm *with x50 Magnification, Polar Kerr Measurement |
| Available Magnification | ×20、×50 *Other Magnifications are also available. |
| Available Magnetic Field | Out-of-plane Direction: Max. ±20kOe (±2T) In-plane Direction: Max. ±7kOe (±0.7T) |
Measurement Example
Kerr Loop Measurement
& Domain Observation System
Model: BH-1071 Series
Summary
Combined system for dynamic (real time) magnetic domain observation and microscopic Kerr loop measurement.

Specification
| Light Source | Diode Laser (408nm or 650nm) High Brightness White LED |
|---|---|
| Target Kerr Effect | Polar Kerr Effect Longitudinal Kerr Effect |
| Spatial Resolution | φ2μm *with x50 Magnification, Polar Kerr Effect |
| Available Magnification | ×20、×50 *Other Magnifications are also available. |
| Available Magnetic Field | Out-of-plane Direction: Max. >±10kOe (±1T) In-plane Direction: Max. >±10kOe (±1T) |
Data Example
Specification
| Light Source | High Brightness White Light |
|---|---|
| Observing Kerr Effect | Polar Kerr Effect Longitudinal Kerr Effect |
| Domain Resolution | < 1μm *with x50 Magnification, Polar Kerr Observation |
| Available Magnification | ×20、×50 *Other Magnifications are also available. |
| Available Magnetic Field | Out-of-plane Direction: Max. ±20kOe (±2T) In-plane Direction: Max. ±20kOe (±2T) |
Observation Example
Permanent Magnet
Permanent Magnet
Amorphous Ribbon
Permalloy (NiFe)
Electromagnetic Steel Sheet
Ferromagnetic Thin Film
Compact Kerr Microscope
Model: BH-753 Series
Summary
Desktop size Kerr Microscope specially designed for sensitive magnetic domain observation of soft magnetic materials.

Specification
| Light Source | High Brightness White LED |
|---|---|
| Target Kerr Effect | Longitudinal Kerr Effect |
| Domain Resolution | 3μm *with x50 Magnification |
| Available Magnification | ×20、×50 |
| Available Magnetic Field | In-plane Direction: Max. ±1kOe (±0.1T) |
Observation Example
Perpendicular Magnetic Recording Media Evaluation System
Model: BH-810CPC Series
Summary
Non-contact Evaluation System for Perpendicular Recording Media (PMR) of Hard Disk with Mapping Evaluation Function.

Specification
| Light Source | Diode Laser (408nm) |
|---|---|
| Measurement Kerr Effect | Polar Kerr Effect |
| Laser Spot Diameter | φ1mm |
| Magnetic Field | Out-of-plane Direction: Max. ±20kOe (±2T) |
| Disk Size | 2.5 Inch or 3.5 Inch Disk |
Measurement Example
Soft Magnetic Layer Evaluation System
Model: BH-618HS-P20 Series
Summary
Non-contact Evaluation System for Soft Magnetic Layer, such as SUL in Hard Disk Media with Mapping and Skew Angle measurement functions.

Specification
| Light Source | Diode Laser (408nm and 780nm) |
|---|---|
| Measurement Kerr Effect | Longitudinal Kerr Effect |
| Laser Spot Diameter | φ2mm |
| Magnetic Field | Out-of-plane Direction: Max. ±2.5kOe (±0.25T) |
| Disk Size | 2.5 Inch or 3.5 Inch Disk |
Measurement Example
HAMR Media Evaluation System
Model: BH-802HM Series
Summary
Non-contact Evaluation System for Heat (Thermal) Assisted Magnetic Recording Media (HAMR or TAMR) with generating magnetic field ±6.5T.

Specification
| Light Source | Diode Laser (408nm) |
|---|---|
| Measurement Kerr Effect | Polar Kerr Effect |
| Laser Spot Diameter | φ1mm |
| Magnetic Field | Out-of-plane Direction: Max. ±65kOe (±6.5T) |
| Disk Size | 3.5 Inch Disk |
Measurement Example
Perpendicular Magnetic AnisotropyEvaluation System
Model: BH-R810 Series
Summary
Angular Dependence Analysis System with rotating sample holder under fixed magnetic field direction.

Specification
| Light Source | Diode Laser (408nm) |
|---|---|
| Measurement Kerr Effect | Polar Kerr Effect |
| Laser Spot Diameter | φ1mm |
| Magnetic Field | Max. ±20kOe (±2T) *Applicable Magnetic Field Angle: <0°~>90° |
| Sample Size | 10 ×10mm (t1mm) *Cut Sample Only |
Measurement Example
Polar Kerr Effect Measurement System for Wafer
BH-810CPC25 Series
Summary
Non-contact Evaluation System for 8 Inch or 12 Inch Wafer targeting mapping measurement of Magnetic Semiconductor.

Specification
| Light Source | Diode Laser (408nm or 650nm) |
|---|---|
| Measurement Kerr Effect | Polar Kerr Effect |
| Laser Spot Diameter | <φ1mm |
| Magnetic Field | Out-of-plane Direction: Max. >±20kOe (±2T) |
| Wafer Size | 8 Inch or 12 Inch Wafer |
Measurement Example
Longitudinal Kerr Effect Measurement System for Wafer
Model:BH-618SK Series
Summary
Non-contact Evaluation System for 8 Inch or 12 Inch Wafer targeting mapping measurement of hard disk head and magnetic sensor.

Specification
| Light Source | Diode Laser (408nm or 650nm) |
|---|---|
| Measurement Kerr Effect | Longitudinal Effect |
| Laser Spot Diameter | φ2mm |
| Magnetic Field | In-Plane Direction: Max. >±2kOe (±0.2T) |
| Wafer Size | 8 Inch or 12 Inch Wafer |




